Authors

Kesters, Els; Ghekiere, John; Van Doorne, Patrick; Vereecke, Guy; Mertens, Paul; Heyns, Marc

Conference

204th Meeting of the Electrochemical Society: 8th Int. Symp. on Cleaning Technology in Semiconductor Device Manufacturing

Title

Effective post-etch residue removal on low-k films using single wafer processing

Publication type

Meeting abstract