Publication:
Effective post-etch residue removal on low-k films using single wafer processing
Date
| dc.contributor.author | Kesters, Els | |
| dc.contributor.author | Ghekiere, John | |
| dc.contributor.author | Van Doorne, Patrick | |
| dc.contributor.author | Vereecke, Guy | |
| dc.contributor.author | Mertens, Paul | |
| dc.contributor.author | Heyns, Marc | |
| dc.contributor.imecauthor | Kesters, Els | |
| dc.contributor.imecauthor | Vereecke, Guy | |
| dc.contributor.imecauthor | Mertens, Paul | |
| dc.contributor.imecauthor | Heyns, Marc | |
| dc.contributor.orcidimec | Vereecke, Guy::0000-0001-9058-9338 | |
| dc.date.accessioned | 2021-10-15T05:09:43Z | |
| dc.date.available | 2021-10-15T05:09:43Z | |
| dc.date.issued | 2003 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/7733 | |
| dc.source.conference | 204th Meeting of the Electrochemical Society: 8th Int. Symp. on Cleaning Technology in Semiconductor Device Manufacturing | |
| dc.source.conferencedate | 13/10/2003 | |
| dc.source.conferencelocation | Orlando, FL USA | |
| dc.title | Effective post-etch residue removal on low-k films using single wafer processing | |
| dc.type | Meeting abstract | |
| dspace.entity.type | Publication | |
| Files | ||
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