Browsing by author "Schreutelkamp, R."

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Study of dopant diffusion and defect evolution for advanced ultra shallow junctions based on atomistic kinetic monte carlo approach

Noda, T.; Vandervorst, Wilfried; Felch, S.; Parihar, V.; Vrancken, Christa; Severi, Simone; Hoffmann, Thomas Y.; Falepin, A.; Janssens, Tom; Bender, Hugo; Van Daele, B.; Eyben, Pierre; Niwa, M.; Schreutelkamp, R.; Nouri, F.; Absil, Philippe; Jurczak, Gosia; De Meyer, Kristin; Biesemans, Serge (2007)
Ultra-shallow junctions formed by C co-implantation with spkie plus sub-melt laser annealing

Felch, S.B.; Collart, E.; Parihar, V.; Thirupapulyur, S.; Schreutelkamp, R.; Pawlak, Bartek; Hoffmann, Thomas Y.; Severi, Simone; Eyben, Pierre; Vandervorst, Wilfried; Noda, Taiji (2008)