Browsing by author "Luk-Pat, Gerard"
Now showing items 1-3 of 3
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Design compliance for Spacer Is Dielectric (SID) patterning
Luk-Pat, Gerard; Miloslavsky, Alex; Painter, Ben; Lin, Li; De Bisschop, Peter; Lucas, Kevin (2012) -
Double-patterning interactions with wafer processing, optical proximity correction, and physical design flows
Lucas, Kevin; Cork, Christopher M.; Miloslavsky, Alexander; Luk-Pat, Gerard; Barnes, Levi D.; Hapli, John; Lewellen, John; Rollins, Gregoy; Wiaux, Vincent; Verhaegen, Staf (2009) -
Printability verification for double-patterning technology
Luk-Pat, Gerard; Panaite, Petrisor; Lucas, Kevin; Cork, Christopher; Wiaux, Vincent; Verhaegen, Staf; Maenhoudt, Mireille (2008)