Browsing by author "Hsu, Stephen"

Assist features: placement, impact and relevance

Mochi, Iacopo; Philipsen, Vicky; Gallagher, Emily; Hendrickx, Eric; Lyakhova, Kateryna; Wittebrood, Friso; Schiffelers, Guido; Fliervoet, Timon; Wang, Shibing; Hsu, Stephen; Plachecki, Vince; Baron, Stan; Laenens, Bart (2016)

Double dipole lithography for 65-nm node and beyond: a technology readiness review

Hsu, Stephen; Eurlings, Mark; Hendrickx, Eric; Van Den Broeke, Douglas J.; Chiou, Tsann-Bim; Fung Chen, J.; Laidig, Thomas L.; Shi, Xuelong; Finders, Jo (2004-08)

Experimental verification of source-mask optimization and freeform illumination for 22 nm node SRAM cells

Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Hsu, Stephen; Liu, Hua Yu; Mouraille, Orion; Schreel, Koen; Dusa, Mircea; Zimmermann, Joerg; Gräupner, Paul; Neumann, Jens Timo (2011-03)

Freeform illumination sources: Source mask optimization for 22 nm node SRAM

Bekaert, Joost; Laenens, Bart; Verhaegen, Staf; Van Look, Lieve; Trivkovic, Darko; Lazzarino, Frederic; Vandenberghe, Geert; Van Adrichem, Paul; Socha, Robert; Mulder, M.; Baron, Stanislas; Tsai, Min-Chun; Ning, Kai; Hsu, Stephen; Bouma, A.; van der Heijden, E.; Schreel, Koen; Carpaij, R.; Dusa, Mircea; Zimmerman, Joerg; Graeupner, Paul; Hennerkes, Christoph (2009)

OPC resist model separability validation after SMO source change

Gillijns, Werner; Van de Kerkhove, Jeroen; Trivkovic, Darko; De Bisschop, Peter; Rio, David; Hsu, Stephen; Feng, Mu; Zang, Qiang; Liu, Hua-Yu (2013)

Through pitch low-k1 contact hole imaging with CPL(TM) technology

Wiaux, Vincent; Bekaert, Joost; Ronse, Kurt; Vandenberghe, Geert; Fung Chen, J.; Hsu, Stephen; Van Den Broeke, Douglas; Socha, Robert (2004)

Through pitch low-k1 contact hole imaging with CPLTM technology

Wiaux, Vincent; Bekaert, Joost; Fung Chen, J.; Hsu, Stephen; Ronse, Kurt; Socha, Robert; Vandenberghe, Geert; Van Den Broeke, Douglas (2004)