OPC resist model separability validation after SMO source change

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Authors
Gillijns, Werner; Van de Kerkhove, Jeroen; Trivkovic, Darko; De Bisschop, Peter; Rio, David; Hsu, Stephen; Feng, Mu; Zang, Qiang; Liu, Hua-Yu
Conference
Optical Microlithography XXVI
Title
OPC resist model separability validation after SMO source change
Publication type
Proceedings paper
Embargo date
9999-12-31
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