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OPC resist model separability validation after SMO source change
Publication:
OPC resist model separability validation after SMO source change
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Date
2013
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Gillijns, Werner
;
Van de Kerkhove, Jeroen
;
Trivkovic, Darko
;
De Bisschop, Peter
;
Rio, David
;
Hsu, Stephen
;
Feng, Mu
;
Zang, Qiang
;
Liu, Hua-Yu
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Acq. date: 2025-12-10
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Views
1925
since deposited on 2021-10-21
3
last month
2
last week
Acq. date: 2025-12-10
Citations