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Double dipole lithography for 65-nm node and beyond: a technology readiness review
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Authors
Hsu, Stephen
;
Eurlings, Mark
;
Hendrickx, Eric
;
Van Den Broeke, Douglas J.
;
Chiou, Tsann-Bim
;
Fung Chen, J.
;
Laidig, Thomas L.
;
Shi, Xuelong
;
Finders, Jo
Conference
Photomask and Next-Generation Lithography Mask Technology XI
Title
Double dipole lithography for 65-nm node and beyond: a technology readiness review
Publication type
Proceedings paper
Embargo date
9999-12-31
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