Browsing by author "Lerch, W."
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Impact of hydrogen on oxygen precipitation and gate oxide integrity after RTA processing
Möller, T.; Obermeier, G.; Bearda, Twan; Huber, A.; Schmolke, R.; von Ammon, W.; Lerch, W. (2001) -
Influence of halo implant on leakage current and sheet resistance of ultra-shallow p-n junctions
Faifer, V.N.; Schroder, D.K.; Current, M.I.; Clarysse, Trudo; Timans, P.J.; Zangerle, T.; Vandervorst, Wilfried; Wong, T.M.H.; Moussa, Alain; McCoy, S.; Gelpey, J.; Lerch, W.; Paul, S.; Bolze, D. (2007) -
Influence of halo implant on leakage current and sheet resistance of ultrashallow p-n junctions
Faifer, V.N.; Schroder, D.K.; Current, M.I.; Clarysse, Trudo; Timans, P.J.; Zangerle, T.; Vandervorst, Wilfried; Wong, T.M.H.; Moussa, Alain; McCoy, S.; Gelpey, S.; Lerch, W. (2007-09) -
Leakage current and dopant activation characterization of SDE/halo CMOS junctions with non-contact junction photo-voltage metrology
Faifer, V.N.; Schroder, D.K.; Current, M.I.; Clarysse, Trudo; Timans, P.J.; Zangerle, T.; Vandervorst, Wilfried; Wong, T.M.H.; Moussa, Alain; McCoy, S.; Gelpey, J.; Lerch, W.; Paul, S.; Bolze, D. (2007)