Browsing by author "Aksenov, Yuri"
Now showing items 1-4 of 4
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Impact of hyper-NA reticle properties on ArF immersion lithography
Leunissen, Peter; Ronse, Kurt; Philipsen, Vicky; Jonckheere, Rik; Aksenov, Yuri; Bekaert, Joost (2004-12) -
Mask-induced polarization effects at high NA
Estroff, Andrew; Fan, Yongfa; Bourov, Anatoly; Smith, Bruce; Foubert, Philippe; Leunissen, Peter; Philipsen, Vicky; Aksenov, Yuri (2005-03) -
Progress in 193nm immersion lithography at IMEC
Ronse, Kurt; Vandenberghe, Geert; Hendrickx, Eric; Leunissen, Peter; Aksenov, Yuri (2005) -
Progress in 193nm immersion lithography at IMEC
Ronse, Kurt; Vandenberghe, Geert; Hendrickx, Eric; Leunissen, Peter; Aksenov, Yuri (2005-01)