Browsing by author "Ordynskyy, Volodymyr"

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Implementation of 248nm based CD metrology for advanced reticle production

Hourd, Andrew; Grimshaw, Anthony; Scheuring, Gerd; Gittinger, Christian; Doebereiner, Stefan; Hillman, Frank; Brueck, Hans-Juergen; Hartmann, Hans; Ordynskyy, Volodymyr; Peter, Kai; Chen, Shiuh-Bin; Chen, Parkson; Jonckheere, Rik; Philipsen, Vicky; Schaetz, Thomas; Sommer, Karl (2003-01)
Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment

Jonckheere, Rik; Philipsen, Vicky; Scheuring, Gerd; Hillman, Frank; Brueck, Hans-Juergen; Ordynskyy, Volodymyr; Peter, Kai; Hourd, Andrew; Schaetz, Thomas; Chen, Shiuh-Bin; Chen, Parkson; Sommer, Karl (2003-01)