Authors

Jonckheere, Rik; Philipsen, Vicky; Scheuring, Gerd; Hillman, Frank; Brueck, Hans-Juergen; Ordynskyy, Volodymyr; Peter, Kai; Hourd, Andrew; Schaetz, Thomas; Chen, Shiuh-Bin; Chen, Parkson; Sommer, Karl

Conference

19th European Conference on Mask Technology for Integrated Circuits and Microcomponents

Title

Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment

Publication type

Proceedings paper