Browsing by author "Werkhoven, Chris"
Now showing items 1-5 of 5
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Electrical properties and reliability of ultrathin remote plasma enhanced CVD Si3N4 layers
Houssa, Michel; Degraeve, Robin; Pomarede, C.; van Dijk, Kitty; Werkhoven, Chris; Mertens, Paul; Heyns, Marc; Stesmans, Andre (1999) -
Ge deep sub-micron HiK/MG pFET with superior drive compared to Si HiK/MG state-of-the-art reference
De Jaeger, Brice; Kaczer, Ben; Zimmerman, Paul; Opsomer, Karl; Winderickx, Gillis; Van Steenbergen, Jan; Van Moorhem, Els; Terzieva, Valentina; Bonzom, Renaud; Leys, Frederik; Arena, Chantal; Bauer, Matthias; Werkhoven, Chris; Caymax, Matty; Meuris, Marc; Heyns, Marc (2007-01) -
Influence of pre and post process conditions on the composition of thin Si3N4 thin films (3nm) studied by XPS and TOFSIMS
Conard, Thierry; De Witte, Hilde; Vandervorst, Wilfried; Houssa, Michel; Heyns, Marc; Pomarede, C.; Werkhoven, Chris (2000) -
Influence of pre and post process conditions on the composition of thin Si3Ni4 thin films (3nm) studied by XPS and TOFSIMS
Conard, Thierry; De Witte, Hilde; Vandervorst, Wilfried; Houssa, Michel; Heyns, Marc; Pomarede, C.; Werkhoven, Chris (1999) -
Single wafer CVD of silicon nitride for CMOS gate applications
Pomarede, C.; Werkhoven, Chris; Weidmann, J.; Bergman, T.; Gschwandtner, A.; Houssa, Michel (1999)