Browsing by author "van Ingen Schenau, Koen"
Now showing items 1-5 of 5
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EUV resist contrast loss determination using interference lithography
Langner, Andreas; Solak, Harun H.; Auzelyte, Vaida; Ekinci, Yasin; David, Christian; Gobrecht, Jens; Gronheid, Roel; van Setten, Eelco; van Ingen Schenau, Koen; Feenstra, Kees (2009) -
Feasibility study of the approach to Flare, shadowing, optical and process corrections for EUVL OPC
Nikolsky, Peter; Davydova, Natalia; van Ingen Schenau, Koen; Van Adrichem, Paul; Hendrickx, Eric; Lorusso, Gian; Jiang, Jiong; Liu, Wei; Liu, Huayu (2009-09) -
Measuring resist-induced contrast loss using EUV interference lithography
Langner, Andreas; Solak, Harun H.; Gronheid, Roel; van Setten, Eelco; Auzelyte, Vaida; Ekinci, Yasin; van Ingen Schenau, Koen; Feenstra, Kees (2010) -
Microstepper vs. interference EUV lithography: effects on resist profiles
Gronheid, Roel; Van Roey, Frieda; Goethals, Mieke; Solak, Harun H.; Ekinci, Yasin; van Ingen Schenau, Koen; Vannuffel, Cyril; Jouve, Amandine (2005) -
Pitch doubling through dual-patterning lithography challenges in integration and litho budgets
Dusa, Mircea; Quaedackers, John; Larsen, Olaf F.A.; Meessen, J.; van der Heijden, Eddy; Dicker, Gerald; Wismans, Onno; de Haas, Paul; van Ingen Schenau, Koen; Finders, Jo; Vleeming, Bert; Storms, Greet; Jaenen, Patrick; Cheng, Shaunee; Maenhoudt, Mireille (2007)