Browsing by author "Nair, Vineet Vijayakrishnan"
Now showing items 1-8 of 8
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Accurate mapping of dose variations on EUV scanners using dose-to-clear exposures and optical ellipsometry
Nair, Vineet Vijayakrishnan; Van Look, Lieve; Aubert, Remko; Hendrickx, Eric (2020) -
Carbon nanotube pellicles: imaging results of the first full-field extreme ultraviolet exposures
Bekaert, Joost; Gallagher, Emily; Jonckheere, Rik; Van Look, Lieve; Aubert, Remko; Klein, Alexander; Yegen, Gokay; Broman, Par; Nair, Vineet Vijayakrishnan; Timmermans, Marina; Pollentier, Ivan; Hendrickx, Eric (2021-05-27) -
CNT pellicles: Imaging results of the first full-field EUV exposures
Bekaert, Joost; Gallagher, Emily; Jonckheere, Rik; Van Look, Lieve; Aubert, Remko; Klein, Alexander; Yegen, Gokay; Broman, Par; Felix, Nelson M.; Lio, Anna; Nair, Vineet Vijayakrishnan; Timmermans, Marina; Pollentier, Ivan; Hendrickx, Eric (2021) -
Impact of annealing temperature on DSA process: toward faster assembly kinetics
Suh, Hyo Seon; Nair, Vineet Vijayakrishnan; Rincon Delgadillo, Paulina; Doise, Jan; Lorusso, Gian; Nealey, Paul; Monreal, Victor; Baskaran, Durairaj; Cao, Yi; Padmanaban, Munirathna; Li, Jin; Kato, Takeshi; Sutani, Takumichi; Ishimoto, Toru; Ikota, Masami; Koshihara, Shunsuke (2018) -
Metal layer single EUV expose at pitch 28nm: how bright field and NTD resist advantages align
Franke, Joern-Holger; Frommhold, Andreas; Davydova, Natalia; Aubert, Remko; Nair, Vineet Vijayakrishnan; Kovalevich, Tatiana; Rio, David; Bekaert, Joost; Wang, Erik; Rispens, Gijsbert; Maslow, Mark; Hendrickx, Eric (2021) -
Novel monitoring of EUV litho cluster for manufacturing insertion
Truffert, Vincent; Ausschnitt, Kit; Nair, Vineet Vijayakrishnan; D'have, Koen (2020) -
Study of EUV reticle storage effects through exposure on EBL2 and NXE
Jonckheere, Rik; Aubert, Remko; Nair, Vineet Vijayakrishnan; Hendrickx, Eric; Wu, Chien-ching; de Rooij-Lohmann, Veronique; Eslstgeest, Dorus; lenseL, Henk; Soltwich, Victor; Hoenicke, Philipp; Kolbe, Michael; Scholze, Frank (2020) -
Tomorrow's pitches on today's 0.33 NA scanner: pupil and imaging conditions to print P24 L/S and P28 contact holes
Franke, Joern-Holger; Bekaert, Joost; Wiaux, Vincent; Nair, Vineet Vijayakrishnan; Hendrickx, Eric; Davydova, Natalia; van Dijk, Andre; Wang, Erik; Maslow, Mark (2020)