Browsing by author "Yoshida, Yukifumi"
Now showing items 1-5 of 5
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Enabling GeH4-HCl in-situ pre-epi clean: impact of water quality on HF last process performance
Wostyn, Kurt; Rondas, Dirk; Loo, Roger; Dhayalan, Sathish Kumar; Hikavyy, Andriy; Elskens, Wim; Vyncke, Alex; Mertens, Paul; Holsteyns, Frank; De Gendt, Stefan; Masaoka, Toru; Yoshida, Yukifumi; Bast, Gerhard; Simpson, Gavin (2015) -
Impact of hydrogen peroxide in ultrapure water
Ogawa, Yuichi; Masaoka, Toru; Gan, Nobuko; Fujimura, Yu; Minato, Yasuharu; Miyazaki, Yoichi; Wostyn, Kurt; Pacco, Antoine; Holsteyns, Frank; Yoshida, Yukifumi (2017) -
Pre-Epi Clean of SiGe 20%: GeH4 and HCl vs H2-based in-situ cleaning
Wostyn, Kurt; Dhayalan, Sathish Kumar; Gencarelli, Federica; Masaoku, Toru; Iino, Hideaki; Yoshida, Yukifumi; Komori, Kana; Douhard, Bastien; Hikavyy, Andriy; Loo, Roger; Holsteyns, Frank (2018-05) -
SiGe vs. Si selective wet etchingfor Si gate-all-around
Komori, Kana; Rip, Jens; Yoshida, Yukifumi; Wostyn, Kurt; Sebaai, Farid; Liu, Wen Dar; Lee, Yi Chia; Sekiguchi, Ryo; Mertens, Hans; Hikavyy, Andriy; Holsteyns, Frank; Horiguchi, Naoto (2018) -
Surface preparation and wet cleaning for germanium surface
Otsuji, Masayuki; Yoshida, Yukifumi; Takahashi, Hiroaki; Sebaai, Farid; Wostyn, Kurt; Holsteyns, Frank; Sato, Masanobu; Shirakawa, Hajime (2017)