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Pre-Epi Clean of SiGe 20%: GeH4 and HCl vs H2-based in-situ cleaning
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Authors
Wostyn, Kurt
;
Dhayalan, Sathish Kumar
;
Gencarelli, Federica
;
Masaoku, Toru
;
Iino, Hideaki
;
Yoshida, Yukifumi
;
Komori, Kana
;
Douhard, Bastien
;
Hikavyy, Andriy
;
Loo, Roger
;
Holsteyns, Frank
Conference
9th International SiGe Technology and Device Meeting / 11th International Conference on Silicon Epitaxy and Heterostructures
Title
Pre-Epi Clean of SiGe 20%: GeH4 and HCl vs H2-based in-situ cleaning
Publication type
Meeting abstract
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