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Pre-Epi Clean of SiGe 20%: GeH4 and HCl vs H2-based in-situ cleaning
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Pre-Epi Clean of SiGe 20%: GeH4 and HCl vs H2-based in-situ cleaning
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Date
2018
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Wostyn, Kurt
;
Dhayalan, Sathish Kumar
;
Gencarelli, Federica
;
Masaoku, Toru
;
Iino, Hideaki
;
Yoshida, Yukifumi
;
Komori, Kana
;
Douhard, Bastien
;
Hikavyy, Andriy
;
Loo, Roger
;
Holsteyns, Frank
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1970
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Acq. date: 2026-08-03
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Views
1970
since deposited on 2021-10-26
2
last month
Acq. date: 2026-08-03
Citations