Browsing by author "Luehrmann, P."
Now showing items 1-3 of 3
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248 nm lithography for the 0.18 μm generation
Vandenberghe, Geert; Tzviatkov, Plamen; Yen, Anthony; Ronse, Kurt; Van den hove, Luc; Luehrmann, P.; Slonaker, S.; van Ingen Schenau, K.; Juffermans, Casper (1996) -
CD control comparison of step & repeat versus step & scan DUV lithography for sub-0.25 μm gate printing
Ronse, Kurt; Maenhoudt, Mireille; Marschner, Thomas; Van den hove, Luc; Streefkerk, B.; Finders, Jo; van Schoot, J.; Luehrmann, P.; Minvielle, A. (1998) -
Sub-0.25 micron lithography applying illumination pupil filtering (quadrupole) on a DUV step-and-repeat system
Finders, Jo; Mulders, A. M.; Krist, J.; Flagello, D.; Luehrmann, P.; Maenhoudt, Mireille; Marschner, Thomas; De Bisschop, Peter; Ronse, Kurt (1998)