Browsing by author "Anwand, W."
Now showing items 1-2 of 2
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n+ doping of Ge by P or As implantation and flash-lamp annealing
Wündisch, C.; Posselt, M.; Anwand, W.; Schmidt, B.; Grötzschel, R.; Mücklich, A.; Skorupa, W.; Simoen, Eddy; Clarysse, Trudo; Satta, Alessandra; Hortenbach, H.; Möller, A.; Pelzing, P. (2008) -
RTA and FLA of Ultra-shallow implanted layers in Ge
Wündisch, C.; Posselt, M.; Anwand, W.; Schmidt, B.; Mücklich, A.; Skorupa, W.; Clarysse, Trudo; Simoen, Eddy (2008)