RTA and FLA of Ultra-shallow implanted layers in Ge

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Authors
Wündisch, C.; Posselt, M.; Anwand, W.; Schmidt, B.; Mücklich, A.; Skorupa, W.; Clarysse, Trudo; Simoen, Eddy
Conference
16th IEEE International Conference on Advanced Thermal Processing of Semiconductors - RTP
Title
RTA and FLA of Ultra-shallow implanted layers in Ge
Publication type
Proceedings paper
Embargo date
9999-12-31
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