Browsing by author "Montgomery, Patrick"
Now showing items 1-6 of 6
-
Arf solutions for low-k1 back-end imaging
Wiaux, Vincent; Montgomery, Patrick; Vandenberghe, Geert; Monnoyer, Philippe; Ronse, Kurt; Conley,; Litt,; Lucas,; Finders, Jo; Socha,; Van Den Broeke, (2003) -
Complementary phase-shift mask towards 70-nm technology node
Driessen, Frank; Vandenberghe, Geert; Ercken, Monique; Montgomery, Patrick; Ronse, Kurt; Van Adrichem, Paul; Li, J.; Liu, H.Y.; Karklin, L. (2002) -
High-NA ArF lithography for 70-nm technologies
Montgomery, Patrick; Vandenberghe, Geert; Lucas, Kevin (2002) -
Mighty hight-t lithography for 65nm generation contacts
Conley, Will; Montgomery, Patrick; Lucas, Kevin; Litt, Lloyd C.; Maltabes, John G.; Dieu, Laurent; Hughes, Gregory P,; Mellenthin, David L.; Socha, Robert J.; Fanucchi, Eric L.; Verhappen, Arjan; Wampler, Kurt E.; Yu, Linda; Schaefer, Erika; Cassel, Shawn; Kuijten, Jan P.; Pijnenburg, Wil; Wiaux, Vincent; Vandenberghe, Geert (2003) -
Model-based design improvements for the 100nm lithography generation
Lucas, Kevin; Postnikov, Sergei; Patterson, Kyle; Yuan, Min-Chi; Thomas, Carla; Thompson, Matt; Carter, Rusty; Litt, Lloyd; Montgomery, Patrick; Wimmer, Karl (2002) -
Process, design and optical proximity correction requirements for the 65nm device generation
Lucas, Kevin; Montgomery, Patrick; Litt, Lloyd C.; Conley, Will; Postnikov, Sergei V.; Wu, Wei; Yuan, Chi-Min; Olivares, Marc; Strozewski, Kirk; Carter, Russell L.; Vasek, James; Smith, David; Fanucchi, Eric L.; Wiaux, Vincent; Vandenberghe, Geert; Toublan, Olivier; Verhappen, Arjan; Kuijten, Jan P.; van Wingerden, Johannes; Kasprowicz, Bryan S.; Tracy, Jeffrey W.; Progler, Christopher J.; Shiro, Eugene; Topouzov, Igor; Wimmer, Karl; Roman, Bernard J. (2003)