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Complementary phase-shift mask towards 70-nm technology node
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Complementary phase-shift mask towards 70-nm technology node
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Date
2002
Proceedings Paper
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Driessen, Frank
;
Vandenberghe, Geert
;
Ercken, Monique
;
Montgomery, Patrick
;
Ronse, Kurt
;
Van Adrichem, Paul
;
Li, J.
;
Liu, H.Y.
;
Karklin, L.
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1918
since deposited on 2021-10-14
1
last month
Acq. date: 2025-12-09
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Metrics
Views
1918
since deposited on 2021-10-14
1
last month
Acq. date: 2025-12-09
Citations