Publication:

Complementary phase-shift mask towards 70-nm technology node

Date

2002

Proceedings Paper

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Author(s)

Driessen, Frank

;

Vandenberghe, Geert

;

Ercken, Monique

;

Montgomery, Patrick

;

;

Van Adrichem, Paul

;

;

;

Statistics

1918 since deposited on 2021-10-14

Acq. date: 2026-02-26