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Model-based design improvements for the 100nm lithography generation
Publication:
Model-based design improvements for the 100nm lithography generation
Date
2002
Proceedings Paper
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18036.pdf
3.71 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Lucas, Kevin
;
Postnikov, Sergei
;
Patterson, Kyle
;
Yuan, Min-Chi
;
Thomas, Carla
;
Thompson, Matt
;
Carter, Rusty
;
Litt, Lloyd
;
Montgomery, Patrick
;
Wimmer, Karl
Journal
Abstract
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1870
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations
Metrics
Views
1870
since deposited on 2021-10-14
Acq. date: 2025-10-23
Citations