Browsing by author "Kim, Insung"
Now showing items 1-4 of 4
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28nm pitch single exposure patterning readiness by metal oxide resist on 0.33NA EUV Lithography
Kim, Il Hwan; Kim, Insung; Park, Changmin; Lee, Jsiun; Ryu, Koungmin; De Schepper, P.; Doise, J.; Kocsis, M.; De Simone, Danilo; Kljucar, Luka; Das, Poulomi; Blanc, Romuald; Beral, Christophe; Severi, Joren; Vandenbroeck, Nadia; Foubert, Philippe; Charley, Anne-Laure; Oak, Apoorva; Xu, Dongbo; Gillijns, Werner; Mitard, Jerome; Tokei, Zsolt; van der Veen, Marleen; Heylen, Nancy; Teugels, Lieve; Le, Quoc Toan; Schleicher, Filip; Leray, Philippe; Ronse, Kurt (2021) -
Flare mitigation strategies in extreme ultraviolet lithography
Kim, Insung; Myers, Alan; Melvin, Lawrence; Ward, Brian; Lorusso, Gian; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2008) -
Shadowing effect compensation
Lorusso, Gian; Kim, Insung; Baudemprez, Bart; Myers, Alan; Hermans, Jan; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2007) -
Systematic quantification of flare mitigation strategies
Myers, Alan; Kim, Insung; Lorusso, Gian; Jonckheere, Rik; Hermans, Jan; Baudemprez, Bart; Goethals, Mieke; Ronse, Kurt (2007)