Browsing by author "Nishimura, Eiichi"

28nm pitch of line/space pattern transfer into silicon substrates with chemo-epitaxy directed self-assembly (DSA) process flow

Chan, BT; Tahara, Shigeru; Parnell, Doni; Rincon Delgadillo, Paulina; Gronheid, Roel; de Marneffe, Jean-Francois; Xu, Kaidong; Nishimura, Eiichi; Werner, Thilo (2013)

A novel CBRAM integration using subtractive dry-etching process of Cu enabling high-performance memory scaling down to 10nm node

Redolfi, Augusto; Goux, Ludovic; Jossart, Nico; Yamashita, Fumiko; Nishimura, Eiichi; Urayama, Daisuke; Fujimoto, Kiwamu; Witters, Thomas; Lazzarino, Frederic; Jurczak, Gosia (2015)

Direct etched Cu characterization for advanced interconnects

Wen, Liang Gong; Yamashita, Fumiko; Tang, Baojun; Croes, Kristof; Tahara, Shigeru; Shimoda, Keiichi; Maeshiro, Takeru; Nishimura, Eiichi; Lazzarino, Frederic; Ciofi, Ivan; Boemmels, Juergen; Tokei, Zsolt (2015)

Etching of Co-Pd with significantly reduced sidewall re-deposition

Radisic, Dunja; Nishimura, Eiichi; Kushibiki, Masato; Wataru, Shimizu; Tahara, Shigeru; Xu, Kaidong; Kim, Woosik; Boullart, Werner (2013)

Low damage cryoetching of low-K materials

Dussart, Remi; Tillocher, Thomas; Leroy, Floriane; Lefaucheux, Philippe; yatsuda, koichi; Maekawa, Kaoru; Nishimura, Eiichi; Zhang, Liping; de Marneffe, Jean-Francois; Baklanov, Mikhaïl (2015)

LWR reduction by novel lithographic and etch techniques

Kobayashi, Shinji; Shimura, Satoru; Kawasaki, Tetsu; Nafus, Kathleen; Hatakeyama, Shinichi; Shite, Hideo; Nishimura, Eiichi; Kushibiki, Masato; Hara, Arisa; Gronheid, Roel; Vaglio Pret, Alessandro; Kitano, Junichi (2010)

STT MRAM patterning challenges

Boullart, Werner; Radisic, Dunja; Paraschiv, Vasile; Cornelissen, Sven; Manfrini, Mauricio; yatsuda, koichi; Nishimura, Eiichi; Ohishi, Tetsuya; Tahara, Shigeru (2013)