LWR reduction by novel lithographic and etch techniques

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Authors
Kobayashi, Shinji; Shimura, Satoru; Kawasaki, Tetsu; Nafus, Kathleen; Hatakeyama, Shinichi; Shite, Hideo; Nishimura, Eiichi; Kushibiki, Masato; Hara, Arisa; Gronheid, Roel; Vaglio Pret, Alessandro; Kitano, Junichi
Conference
Advances in Resist Materials and Processing Technology XXVII
Title
LWR reduction by novel lithographic and etch techniques
Publication type
Proceedings paper
Embargo date
9999-12-31
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