Publication:

LWR reduction by novel lithographic and etch techniques

Date

2010
Proceedings Paper
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dc.contributor.authorKobayashi, Shinji
dc.contributor.authorShimura, Satoru
dc.contributor.authorKawasaki, Tetsu
dc.contributor.authorNafus, Kathleen
dc.contributor.authorHatakeyama, Shinichi
dc.contributor.authorShite, Hideo
dc.contributor.authorNishimura, Eiichi
dc.contributor.authorKushibiki, Masato
dc.contributor.authorHara, Arisa
dc.contributor.authorGronheid, Roel
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorKitano, Junichi
dc.contributor.imecauthorNafus, Kathleen
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.date.accessioned2021-10-18T17:44:58Z
dc.date.available2021-10-18T17:44:58Z
dc.date.embargo9999-12-31
dc.date.issued2010
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/17391
dc.source.beginpage763914
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXVII
dc.source.conferencedate21/02/2010
dc.source.conferencelocationSan Jose, CA USA
dc.title

LWR reduction by novel lithographic and etch techniques

dc.typeProceedings paper
dspace.entity.typePublication
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