Browsing by author "Schild, R."
Now showing items 1-4 of 4
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Elimination of HF-last cleaning related CoSi2 defects formation
Zou, Gang; Jonckx, Franky; Alves Donaton, Ricardo; Kuper, Werner; Maex, Karen; Mertens, Paul; Meuris, Marc; Heyns, Marc; Locke, Klaus; Korac, M.; Schild, R. (1994) -
Marangoni drying: a new concept for drying silicon wafers
Schild, R.; Locke, Klaus; Kozak, M.; Heyns, Marc (1994) -
New drying techology for advanced cleaning in IC manufacturing
Meuris, Marc; Mertens, Paul; Schmidt, Harald; Hurd, Trace; Li, Li; Heyns, Marc; Jonckx, Franky; Maex, Karen; Schild, R.; Locke, K.; Kozak, M. (1994) -
The IMEC-Clean: A new, highly efficient cleaning and drying technique for Si wafers
Heyns, Marc; Maex, Karen; Schild, R. (1995)