New drying techology for advanced cleaning in IC manufacturing

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Authors
Meuris, Marc; Mertens, Paul; Schmidt, Harald; Hurd, Trace; Li, Li; Heyns, Marc; Jonckx, Franky; Maex, Karen; Schild, R.; Locke, K.; Kozak, M.
Conference
Vacuum and Semiconductor Processing Conference
Title
New drying techology for advanced cleaning in IC manufacturing
Publication type
Proceedings paper
Embargo date
9999-12-31
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