Publication:

New drying techology for advanced cleaning in IC manufacturing

Date

1994
Proceedings Paper
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16433.pdf 66.76 KB

Author(s)

Meuris, Marc  
;
Mertens, Paul  
;
Schmidt, Harald
;
Hurd, Trace
;
Li, Li
;
Heyns, Marc  
;
Jonckx, Franky
;
Maex, Karen  
;
Schild, R.
;
Locke, K.
;
Kozak, M.

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2090 since deposited on 2021-09-29
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