Browsing by author "Ostling, M."
Now showing items 1-6 of 6
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Reduced self-heating by strained silicon substrate engineering
O'Neill, Anthony; Agaiby, Rimoon; Olsen, Sarah; Yang, Y.; Hellstrom, P.-E.; Ostling, M.; Oehme, M.; Lyutovich, K.; Kasper, E.; Eneman, Geert; Verheyen, Peter; Loo, Roger; Claeys, Cor; Fiegna, C.; Sangiorgi, E. (2008) -
Reduced self-heating by strained silicon substrate engineering
O'Neill, A.; Olsen, S.; Yang, Y.; Agaiby, R.; Hellstrom, P.E.; Ostling, M.; Lyutovich, K.; Kasper, E.; Eneman, Geert; Verheyen, Peter; Loo, Roger; Claeys, Cor; Fiegna, C.; Sangiorgio, E. (2007) -
Reduced self-heating by strained silicon substrate engineering
O'Neill, A.; Olsen, S.; Yang, Y.; Agaiby, R.; Hellstrom, P.E; Ostling, M.; Lyutovich, K.; Kasper, E.; Eneman, Geert; Verheyen, Peter; Loo, Roger; Claeys, Cor; Fiegna, C.; Sangiorgi, E. (2007) -
Strain engineering for high mobility channels
Olsen, S.; Al Tarawneh, Z.; Varzgar, J,; Escobedo-Cousin, E.; Agaiby, R.; Dobrosz, P.; O'Neill, A.; Hellstrom, P.E.; Ostling, M.; Parker, E.; Loo, Roger; Claeys, Cor (2008) -
Strained Si/SiGe MOS technology
Olsen, S.; Yan, L.; Agaiby, R.; Escobedo-Cousin, E.; O'Neill, A.G.; Hellstrom, P.-E.; Ostling, M.; Lyutovich, L.; Kasper, E.; Claeys, Cor; Parker, E.H.C. (2007) -
Strained Si/SiGe MOS technology: improving gate dielectric integrity
Olsen, S.H.; Yan, L.; Agaiby, R.; Escobedo-Cousin, A.G.; O'Neil, A.G.; Hellstrom, P.E.; Ostling, M.; Lyutovich, K.; Kasper, E.; Claeys, Cor; Parker, E.H.C. (2009)