Browsing by author "Myers, Alan"
Now showing items 1-15 of 15
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A novel method for characterizing resist performance
Van Steenwinckel, David; Gronheid, Roel; Lammers, J.H.; Myers, Alan; Van Roey, Frieda; Willems, Patrick (2007) -
Compensation of overlay errors due to mask bending and non-flatness for EUV masks
Chandhok, Manish; Goyal, Sanjay; Carson, Steve; Park, Seh-Jin; Zhang, Guojing; Myers, Alan; Leeson, Michael; Kamna, Marilyn; Martinez, Fabian; Stivers, Alan; Lorusso, Gian; Hermans, Jan; Hendrickx, Eric; Govindjee, Sanjay; Brandstetter, Gerd; Laursen, Tod (2009) -
EUV lithography program at IMEC
Goethals, Mieke; Jonckheere, Rik; Lorusso, Gian; Hermans, Jan; Van Roey, Frieda; Myers, Alan; Chandhok, Manish; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Gronheid, Roel; Baudemprez, Bart; Ronse, Kurt (2007) -
EUV pattern shift compensation strategies
Schmoeller, Thomas; Klimpel, Thomas; Kim, In Sung; Lorusso, Gian; Myers, Alan; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2008) -
EUVL at IMEC: shadowing compensation and Flare mitigation
Lorusso, Gian; Goethals, Mieke; Jonckheere, Rik; Hermans, Jan; Ronse, Kurt; Myers, Alan; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Ritter, D. (2007-11) -
Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections
Myers, Alan; Lorusso, Gian; Kim, In Sung; Goethals, Mieke; Jonckheere, Rik; Hermans, Jan; Baudemprez, Bart; Ronse, Kurt (2008) -
Flare mitigation strategies in extreme ultraviolet lithography
Kim, Insung; Myers, Alan; Melvin, Lawrence; Ward, Brian; Lorusso, Gian; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2008) -
Full field EUV lithography turning into reality at IMEC
Jonckheere, Rik; Lorusso, Gian; Goethals, Mieke; Hermans, Jan; Baudemprez, Bart; Myers, Alan; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Ronse, Kurt (2007) -
Imaging performance of the EUV alpha demo tool at IMEC
Lorusso, Gian; Hermans, Jan; Goethals, Mieke; Baudemprez, Bart; Van Roey, Frieda; Myers, Alan; Kim, In Sung; Kim, Byeong Soo; Jonckheere, Rik; Niroomand, Ardavan; Lok, E.; Van Dijk, A.; de Marneffe, Jean-Francois; Demuynck, Steven; Goossens, Danny; Ronse, Kurt (2008) -
Implementing full field EUV lithography using the ADT
Goethals, Mieke; Hendrickx, Eric; Jonckheere, Rik; Lorusso, Gian; Baudemprez, Bart; Hermans, Jan; Laidler, David; Niroomand, Ardavan; Van Roey, Frieda; van Dijk, Andre; Romijn, Leon; Stepanenko, Nickolay; Timoshkov, Vadim; Iwamoto, Fumio; Myers, Alan; Hyun, Yoonsuk; Lim, Changmoon; Pollentier, Ivan; Leeson, Michael; de Marneffe, Jean-Francois; Demuynck, Steven; Ronse, Kurt (2008) -
Investigation of EUV mask defectivity via full-field printing and inspection on wafer
Jonckheere, Rik; Van Den Heuvel, Dieter; Iwamoto, Fumio; Stepanenko, Nickolay; Myers, Alan; Lamantia, Matthew; Goethals, Mieke; Hendrickx, Eric; Ronse, Kurt (2009) -
Progress in full field EUV lithography program at IMEC
Goethals, Mieke; Lorusso, Gian; Jonckheere, Rik; Baudemprez, Bart; Hermans, Jan; Iwamoto, Fumio; Kim, Byeong Soo; Kim, In Sung; Myers, Alan; Niroomand, Ardavan; Stepanenko, Nickolay; Van Roey, Frieda; Pollentier, Ivan; Ronse, Kurt (2007) -
Shadowing effect compensation
Lorusso, Gian; Kim, Insung; Baudemprez, Bart; Myers, Alan; Hermans, Jan; Jonckheere, Rik; Goethals, Mieke; Ronse, Kurt (2007) -
Status of EUV lithography at IMEC
Goethals, Mieke; Jonckheere, Rik; Lorusso, Gian; Hermans, Jan; Van Roey, Frieda; Myers, Alan; Kim, In Sung; Niroomand, Ardavan; Iwamoto, Fumio; Stepanenko, Nickolay; Ronse, Kurt (2007) -
Systematic quantification of flare mitigation strategies
Myers, Alan; Kim, Insung; Lorusso, Gian; Jonckheere, Rik; Hermans, Jan; Baudemprez, Bart; Goethals, Mieke; Ronse, Kurt (2007)