Publication:

Investigation of EUV mask defectivity via full-field printing and inspection on wafer

Date

2009

Proceedings Paper

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Files

17965.pdf 2.12 MB

Author(s)

Jonckheere, Rik

;

Van Den Heuvel, Dieter

;

;

Stepanenko, Nickolay

;

;

Lamantia, Matthew

;

Goethals, Mieke

;

Hendrickx, Eric

;

Metrics

1926 since deposited on 2021-10-17

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Acq. date: 2025-12-09