Investigation of EUV mask defectivity via full-field printing and inspection on wafer

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Authors
Jonckheere, Rik; Van Den Heuvel, Dieter; Iwamoto, Fumio; Stepanenko, Nickolay; Myers, Alan; Lamantia, Matthew; Goethals, Mieke; Hendrickx, Eric; Ronse, Kurt
Conference
Photomask and Next-Generation Lithography Mask Technology XVI
Title
Investigation of EUV mask defectivity via full-field printing and inspection on wafer
Publication type
Proceedings paper
Embargo date
9999-12-31
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