Publication:

Investigation of EUV mask defectivity via full-field printing and inspection on wafer

Date

2009
Proceedings Paper
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dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorIwamoto, Fumio
dc.contributor.authorStepanenko, Nickolay
dc.contributor.authorMyers, Alan
dc.contributor.authorLamantia, Matthew
dc.contributor.authorGoethals, Mieke
dc.contributor.authorHendrickx, Eric
dc.contributor.authorRonse, Kurt
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.imecauthorHendrickx, Eric
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.accessioned2021-10-17T23:13:34Z
dc.date.available2021-10-17T23:13:34Z
dc.date.embargo9999-12-31
dc.date.issued2009
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/15548
dc.source.beginpage73790R
dc.source.conferencePhotomask and Next-Generation Lithography Mask Technology XVI
dc.source.conferencedate8/04/2009
dc.source.conferencelocationYokohama Japan
dc.title

Investigation of EUV mask defectivity via full-field printing and inspection on wafer

dc.typeProceedings paper
dspace.entity.typePublication
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