Browsing by author "Hoefnagels, Rik"
Now showing items 1-4 of 4
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Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100
Goethals, Mieke; Van Roey, Frieda; Hosokawa, Kohei; Hoefnagels, Rik; Niroomand, Ardavan; Foubert, Philippe (2012) -
Impact of acid statistics on EUV local critical dimension uniformity
Jiang, Jing; De Simone, Danilo; Yildirim, Oktay; Meeuwissen, Marieke; Hoefnagels, Rik; Rispens, Gijs; Derks, Paul; Custers, Rolf (2017) -
Today's scorecard for tomorrow's photoresist: progress and outlook towards High-NA EUV lithography
Santaclara, Jara G; Rispens, Gijsbert; Bekaert, Joost; Thiam, Arame; Maslow, Mark; Hoefnagels, Rik; Zuurbier, Nadia; van Lent, Lidia; Fong Choi, Yin (2021) -
Understanding of Out-of-Band DUV light in EUV lithography: controlling impact on imaging and mitigation strategies
Davydova, Natalia; Kottumakulal, Ram; Hageman, J.; McNamara, J.; Hoefnagels, Rik; Vaenkatesan, V.; van Dijk, Andre; Ricken, K.; de Winter, L.; De Kruif, Robert; Jonckheere, Rik; Hollink, T.; Schiffelers, Guido; van Setten, Eelco; Colsters, P.; Liebregts, W.; Pellens1, Rudy; van Dijk, Joep (2015)