Browsing by author "Yamane, Takeshi"
Now showing items 1-4 of 4
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ABI tool performance confirmation by NXE3300 printing results for native EUV blank defects at 16nm half pitch
Jonckheere, Rik; Yamane, Takeshi; Takagi, Noriaki; Watanabe, Hidehiro; Beral, Christophe (2016-11) -
ABI tool performance confirmed by NXE3300 printing results
Jonckheere, Rik; Takagi, Noriaki; Watanabe, Hidehiro; Yamane, Takeshi; Van Den Heuvel, Dieter; Gallagher, Emily (2015-10) -
Blank defect coverage budget for 16nm half-pitch single EUV exposure
Jonckheere, Rik; Yamane, Takeshi; Morikawa, Yasutaka; Kamo, Takashi (2018) -
Printability estimation of EUV blank defect using actinic image
Yamane, Takeshi; Kamo, Takashi; Jonckheere, Rik (2018)