Authors

Jonckheere, Rik; Yamane, Takeshi; Takagi, Noriaki; Watanabe, Hidehiro; Beral, Christophe

Conference

International Symposium on Extreme Ultraviolet Lithography - EUVL

Title

ABI tool performance confirmation by NXE3300 printing results for native EUV blank defects at 16nm half pitch

Publication type

Proceedings paper