Authors

Jonckheere, Rik; Yamane, Takeshi; Morikawa, Yasutaka; Kamo, Takashi

Conference

Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology

Title

Blank defect coverage budget for 16nm half-pitch single EUV exposure

Publication type

Proceedings paper

Embargo date

9999-12-31