Browsing by author "Lucas, K."
Now showing items 1-3 of 3
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100nm generation contact patterning by low temperature 193nm resist reflow process
Van Driessche, V.; Grozev, G.; Lucas, K.; Van Roey, Frieda; Tzviatkov, Plamen (2002) -
Line-edge roughness reduction and CD slimming using hardback processing
Peters, R.D.; Lucas, K.; Cobb, J.L.; Parker, C.; Patterson, K.; McCauley, R.; Ercken, Monique; Van Roey, Frieda; Vandenbroeck, Nadia; Pollentier, Ivan (2003) -
Resist reflow for 193-nm low-K1 lithography contacts
Montgomery, P.K.; Lucas, K.; Strozewski, K.J.; Zavyalova, L.; Grozev, Grozdan; Reybrouck, Mario; Tzviatkov, P.; Maenhoudt, Mireille (2003)