Browsing by author "Biebuyck, J.J."

Now showing items 1-2 of 2

Characterization of post-etch photoresists used in metal hardmask and photoresist mask patterning schemes

Kesters, Els; Claes, Martine; Lux, Marcel; Le, Quoc Toan; Vereecke, Guy; Franquet, Alexis; Conard, Thierry; Mertens, Paul; Adriaensens, Peter; Carleer, Robert; Biebuyck, J.J.; Van Veltem, P.; Bebelman, Sabine (2007)
Chemical and structural modifications in a 193-nm photoresist after low-k dry etch

Kesters, Els; Claes, Martine; Le, Quoc Toan; Lux, Marcel; Franquet, Alexis; Vereecke, Guy; Mertens, Paul; Frank, Martin M.; Carleer, Robert; Adriaensens, Peter; Biebuyck, J.J.; Bebelman, Sabine (2008)