Authors

Kesters, Els; Claes, Martine; Lux, Marcel; Le, Quoc Toan; Vereecke, Guy; Franquet, Alexis; Conard, Thierry; Mertens, Paul; Adriaensens, Peter; Carleer, Robert; Biebuyck, J.J.; Van Veltem, P.; Bebelman, Sabine

Conference

1st International Workshop Plasma Etch and Strip in Microelectronics - PESM

Title

Characterization of post-etch photoresists used in metal hardmask and photoresist mask patterning schemes

Publication type

Oral presentation