Publication:

Characterization of post-etch photoresists used in metal hardmask and photoresist mask patterning schemes

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2056 since deposited on 2021-10-16
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Acq. date: 2026-07-20

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2056 since deposited on 2021-10-16
1last month
1last week
Acq. date: 2026-07-20

Citations