Chemical and structural modifications in a 193-nm photoresist after low-k dry etch

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Authors

Kesters, Els; Claes, Martine; Le, Quoc Toan; Lux, Marcel; Franquet, Alexis; Vereecke, Guy; Mertens, Paul; Frank, Martin M.; Carleer, Robert; Adriaensens, Peter; Biebuyck, J.J.; Bebelman, Sabine

ISSN

0040-6090

Issue

11

Journal

Thin Solid Films

Volume

516

Title

Chemical and structural modifications in a 193-nm photoresist after low-k dry etch

Publication type

Journal article

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