Browsing by author "Santoro, Gaetano"
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Direct yield prediction from SEM images
Choona, Lilach; Linshiz, Jasmine; Pres, Shaul; Levant, Boris; Tal, Noam; Santoro, Gaetano; Baudot, Sylvain; Opdebeeck, Ann; Reifsnider, Jason; Vadakupudhu Palayam, Senthil; Lorusso, Gian; Mitard, Jerome; Yogev, Shay (2023) -
e-beam metrology of thin resist for high NA EUVL
Lorusso, Gian; De Simone, Danilo; Zidan, Mohamed; Severi, Joren; Moussa, Alain; Dey, Bappaditya; Halder, Sandip; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; De Gendt, Stefan; Leray, Philippe (2023) -
Enabling Non-Actinic EUV Mask Inspection using CNT Pellicle
Keshet, Mor; Gershon, Dor; Malul, Uriel; Blinder, Yaniv; Orr, Yonatan; Tam, Aviram; Santoro, Gaetano; Houchens, Kevin; Gallagher, Emily; Timmermans, Marina; Frommhold, Andreas; Lorusso, Gian (2021) -
Metrology of Thin Resist for High NA EUVL
Lorusso, Gian; Beral, Christophe; Bogdanowicz, Janusz; De Simone, Danilo; Hasan, Mahmudul; Jehoul, Christiane; Moussa, Alain; Saib, Mohamed; Zidan, Mohamed; Severi, Joren; Truffert, Vincent; Van Den Heuvel, Dieter; Goldenshtein, Alex; Houchens, Kevin; Santoro, Gaetano; Fischer, Daniel; Muellender, Angelika; Hung, Joey; Koret, Roy; Turovets, Igor; Ausschnitte, Kit; Mack, Chris; Kondo, Tsuyoshi; Shohjoh, Tomoyasu; Ikota, Masami; Charley, Anne-Laure; Leray, Philippe (2022) -
Recess metrology challenges for 3D device architectures in advanced technology nodes
Santoro, Gaetano; Houchens, Kevin; Bogdanowicz, Janusz; Elizov, Moshe; Yaron, Lior; Chemama, Michael; Goldenshtein, Alex; Zakay, Amit; Amit, Noam; Briggs, Basoene; Pacco, Antoine; Delhougne, Romain; Cockburn, Andrew; Abramovitz, Yaniv; Tam, Aviram; Adan, Ofer; Mertens, Hans; Charley, Anne-Laure; Horiguchi, Naoto; Leray, Philippe; Lorusso, Gian (2022)