Browsing by author "Bovie, Inge"

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4X reticles with 3% linewidth control for the development of 0.18 µm lithography

Jonckheere, Rik; Moonens, Jos; Potoms, Goedele; Bovie, Inge; Van den hove, Luc (1996)
Challenges with respect to high-k/metal gate stack etching and cleaning

Vos, Rita; Arnauts, Sophia; Bovie, Inge; Onsia, Bart; Garaud, Sylvain; Xu, Kaidong; Yu, HongYu; Kubicek, Stefan; Rohr, Erika; Schram, Tom; Veloso, Anabela; Conard, Thierry; Leunissen, Peter; Mertens, Paul (2007)