4X reticles with 3% linewidth control for the development of 0.18 µm lithography

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Authors
Jonckheere, Rik; Moonens, Jos; Potoms, Goedele; Bovie, Inge; Van den hove, Luc
Conference
16th Annual Symposium on Photomask Technology and Management
Title
4X reticles with 3% linewidth control for the development of 0.18 µm lithography
Publication type
Proceedings paper
Embargo date
9999-12-31
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