Skip to content
Institutional repository
Communities & Collections
Browse
Site
Log In
imec Publications
Conference contributions
4X reticles with 3% linewidth control for the development of 0.18 µm lithography
Publication:
4X reticles with 3% linewidth control for the development of 0.18 µm lithography
Date
1996
Proceedings Paper
Simple item page
Full metadata
Statistics
Loading...
Loading...
Files
1263.pdf
1.97 MB
Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Jonckheere, Rik
;
Moonens, Jos
;
Potoms, Goedele
;
Bovie, Inge
;
Van den hove, Luc
Journal
Abstract
Description
Metrics
Views
2039
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations
Metrics
Views
2039
since deposited on 2021-09-29
Acq. date: 2025-10-23
Citations