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Conference contributions
Challenges with respect to high-k/metal gate stack etching and cleaning
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Challenges with respect to high-k/metal gate stack etching and cleaning
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Date
2007
Proceedings Paper
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Basic data
APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Vos, Rita
;
Arnauts, Sophia
;
Bovie, Inge
;
Onsia, Bart
;
Garaud, Sylvain
;
Xu, Kaidong
;
Yu, HongYu
;
Kubicek, Stefan
;
Rohr, Erika
;
Schram, Tom
;
Veloso, Anabela
;
Conard, Thierry
;
Leunissen, Peter
;
Mertens, Paul
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1984
since deposited on 2021-10-16
3
last month
1
last week
Acq. date: 2026-01-07
Citations
Metrics
Views
1984
since deposited on 2021-10-16
3
last month
1
last week
Acq. date: 2026-01-07
Citations