Challenges with respect to high-k/metal gate stack etching and cleaning

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Authors
Vos, Rita; Arnauts, Sophia; Bovie, Inge; Onsia, Bart; Garaud, Sylvain; Xu, Kaidong; Yu, HongYu; Kubicek, Stefan; Rohr, Erika; Schram, Tom; Veloso, Anabela; Conard, Thierry; Leunissen, Peter; Mertens, Paul
Conference
Physics and Technology of High-k Dielectrics
Title
Challenges with respect to high-k/metal gate stack etching and cleaning
Publication type
Proceedings paper
Embargo date
9999-12-31
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