Browsing by author "Laidler, David"
Now showing items 21-40 of 46
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Further study on the verification of CD-SEM based monitoring for hyper NA lithography
Ishimoto, Toru; Osaki, M.; Sekiguchi, Kohei; Hasegawa, N.; Watanabe, K.; Laidler, David; Cheng, Shaunee (2008) -
Identifying sources of overlay error in FinFET technology
Laidler, David (2005) -
Immersion specific error contributions to overlay control
D'have, Koen; Laidler, David; Cheng, Shaunee (2008) -
Implementing full field EUV lithography using the ADT
Goethals, Mieke; Hendrickx, Eric; Jonckheere, Rik; Lorusso, Gian; Baudemprez, Bart; Hermans, Jan; Laidler, David; Niroomand, Ardavan; Van Roey, Frieda; van Dijk, Andre; Romijn, Leon; Stepanenko, Nickolay; Timoshkov, Vadim; Iwamoto, Fumio; Myers, Alan; Hyun, Yoonsuk; Lim, Changmoon; Pollentier, Ivan; Leeson, Michael; de Marneffe, Jean-Francois; Demuynck, Steven; Ronse, Kurt (2008) -
In-line litho cluster monitoring and control using integrated scatterometry
Pollentier, Ivan; Cheng, Shaunee; Baudemprez, Bart; Laidler, David; van Dommelen, Y.; Carpaij, R.; Yu, J.; Uchida, J.; Viswanathan, A.; Chin, D.T.; Barry, K.; Jakatdar, N. (2004-02) -
Integration challenges for multi-gate devices
Collaert, Nadine; Brus, Stephan; De Keersgieter, An; Dixit, Abhisek; Ferain, Isabelle; Goodwin, Michael; Kottantharayil, Anil; Rooyackers, Rita; Verheyen, Peter; Yim, Yong Sik; Zimmerman, Paul; Beckx, Stephan; Degroote, Bart; Demand, Marc; Kim, Myeong-Cheol; Kunnen, Eddy; Locorotondo, Sabrina; Mannaert, Geert; Neuilly, Francois; Shamiryan, Denis; Baerts, Christina; Ercken, Monique; Laidler, David; Leys, Frederik; Loo, Roger; Lisoni, Judit; Snow, Jim; Vos, Rita; Boullart, Werner; Pollentier, Ivan; De Gendt, Stefan; De Meyer, Kristin; Jurczak, Gosia; Biesemans, Serge (2005) -
Integration of tall triple-gate devices with inserted TaxNy gate in a 0.274μm² 6T-SRAM cell and advanced CMOS logic circuits
Witters, Liesbeth; Collaert, Nadine; Nackaerts, Axel; Demand, Marc; Demuynck, Steven; Delvaux, Christie; Lauwers, Anne; Baerts, Christina; Beckx, Stephan; Boullart, Werner; Brus, Stephan; Degroote, Bart; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Ercken, Monique; Goodwin, Michael; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Leray, Philippe; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Willems, Patrick; Wouters, Johan M. D.; Jurczak, Gosia; Biesemans, Serge (2005) -
Knowledge-based APC methodology for overlay control
Laidler, David; Leray, Philippe; Crow, D.A.; Roberts, K.E. (2003) -
Mix and match overlay optimization for advanced lithography tools (193i and EUV)
Laidler, David; D'have, Koen; Hermans, Jan; Cheng, Shaunee (2012) -
Overlay accuracy with respect to device scaling
Leray, Philippe; Laidler, David; Cheng, Shaunee (2012) -
Overlay metrology for double patterning processes
Leray, Philippe; Cheng, Shaunee; Laidler, David; Kandel, Daniel; Adel, Mike; Dinu, Berta; Polli, Marco; Vasconi, Mauri; Salski, Bartlomiej (2009) -
Overlay progress in EUV lithography towards adoption for manufacturing
Hermans, Jan; Laidler, David; Hendrickx, Eric; Pigneret, Charles; van Dijk, Andre; Voznyi, Alex; Dusa, Mircea (2011) -
Performance of the ASML EUV Alpha demo tool
Hermans, Jan; Hendrickx, Eric; Laidler, David; Jehoul, Christiane; Van Den Heuvel, Dieter; Goethals, Mieke (2010) -
Performance update of XT:1250Di
Maenhoudt, Mireille; Van Den Heuvel, Dieter; Cheng, Shaunee; Laidler, David; Hermans, Jan (2005) -
Performance verification of resist loss measurement method using top-view CD-SEM images for hyper-NA lithography
Osaki, Mayuka; Tanaka, Maki; Shishido, Chie; Cheng, Shaunee; Laidler, David; Ercken, Monique; Altamirano Sanchez, Efrain (2009) -
Progress in EUV Lithography towards manufacturing from an exposure tool perspective
Hermans, Jan; Laidler, David; Foubert, Philippe; D'have, Koen; Cheng, Shaunee; Hendrickx, Eric; Dusa, Mircea (2012) -
Requirements on CD and Overlay for 200GHz QSA SiGe:C HBT's
Van Wichelen, Koen; Witters, Liesbeth; Van Huylenbroeck, Stefaan; Leray, Philippe; Laidler, David; Kunnen, Eddy; Decoutere, Stefaan (2004-09) -
Scatterometry metrology validation with respect to process control
Leray, Philippe; Cheng, Shaunee; Laidler, David; D'have, Koen; Charley, Anne-Laure (2010) -
Sources of overlay error in double patterning integration schemes
Laidler, David; Leray, Philippe; D'have, Koen; Cheng, Shaunee (2008) -
Sources of overlay error in double patterning integration schemes
Laidler, David; Leray, Philippe; D'have, Koen; Cheng, Shaunee (2008)